Direct writing of Mo microstructures using high brilliance synchrotron radiation

Abstract

Direct deposition of Mo microstructures on Si is demonstrated by photolytic decomposition of condensed Mo(CO)6 using the aperture-limited, high-intensity radiation from an undulator at the BESSY storage ring. A particular advantage of the instrument, a new photon-induced scanning Auger microscope, is the possibility of quasisimultaneous exposure (writing) and analysis employing photoemission (PES) or x-ray induced Auger spectroscopy (XAES) with sufficient energy resolution for detection of chemical differences. The present spatial resolution is 20–30 μm (for PES and writing) and 3 μm (for XAES), but this will be improved by adding focusing mirrors.