Abstract
Epitaxial thin films of LaNiO2, which is an oxygen-deficient perovskite with “infinite layers” of Ni1+O2, were prepared by a low-temperature reduction of LaNiO3 single-crystal films on NdGaO3 substrates. We report the high-angle annular dark-field and bright-field scanning transmission electron microscopy observations of infinite NiO2 planes of c-axis-oriented LaNiO2 epitaxial thin films with a layer stacking sequence of NiO2/La/NiO2. Resistivity measurements on the films show T2 dependence between 400 and 150 K and a negative Hall coefficient.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.