Direct Measurement of Resistance of Multiwalled Carbon Nanotubes Using Micro Four-Point Probes

Abstract

The electrical properties of multiwalled carbon nanotubes was investigated by micro four point probes, fabricated using conventional silicon microfabrication techniques. After positioning of chemical vapour deposition-grown multi-walled carbon nanotubes on a SiO2 substrate, the twoor fourpoint resistance at specific positions along the nanotubes, was measured by microprobes with different microelectrode spacings. Individual nanotubes were investigated in more detail by measuring current as a function of bias voltage until the point of failure and the results are compared to previously reported findings, using conventional measurement techniques.