Abstract

RuO2 nano-plate architectures were successfully deposited directly on stainless steel current collectors by low pressure chemical vapor deposition at low temperatures using ruthenocene, Ru(C5H5)2 as the starting precursor without applying any catalyst. As-prepared materials were characterized by powder X-ray diffraction and field-emission scanning electron microscope techniques. Galvanostatic charge-discharge experiments were carried out versus Li-metal. A capacity of 1150 mAh g-1 was observed during the first discharge process. After 20 cycles, the materials stabilizes at 1000 mAh g-1 which represents only a 13% loss in capacity. The improvement in cycle life at high capacity is attributed to the growth process and unique nanostructure of RuO2.

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