Abstract
Photoresists developable in dilute aqueous bases are introduced for environmentally friendly photoresist processing and biopatterning. The proposed photoresists are of positive or negative tone, chemically amplified, based on synthesized (meth)acrylate copolymers bearing either pendant t-butyl ester group or 2-hydroxylethyl ester group for positive and negative imaging, respectively. Characteristic high-resolution lithographic results (0.13 μm lines) obtained with a positive (meth)acrylate-based chemically amplified resist formulation upon development with 13×10−3 M TMAH solution are presented. On the other hand, a slightly modified resist formulation was used for biomolecule patterning under biocompatible conditions and protein microstructures (<10 μm equally spaced lines) are demonstrated.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.