Abstract
Photoresists developable in dilute aqueous bases are introduced for environmentally friendly photoresist processing and biopatterning. The proposed photoresists are of positive or negative tone, chemically amplified, based on synthesized (meth)acrylate copolymers bearing either pendant t-butyl ester group or 2-hydroxylethyl ester group for positive and negative imaging, respectively. Characteristic high-resolution lithographic results (0.13 μm lines) obtained with a positive (meth)acrylate-based chemically amplified resist formulation upon development with 13×10−3 M TMAH solution are presented. On the other hand, a slightly modified resist formulation was used for biomolecule patterning under biocompatible conditions and protein microstructures (<10 μm equally spaced lines) are demonstrated.
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