Digital moiré fringe measurement method for alignment in imprint lithography

Abstract

Accurate layer-to-layer alignment, which is of prime importance for the fabrication of multilayer nanostructures in integrated circuits, is one of the main obstacles for imprint lithography. Current alignment measurement techniques commonly involve an image detection process for coarse alignment followed by a grating interference process for fine alignment. Though this kind of two-level alignment system is reasonable for measurement, when it is used in real imprint lithography, it is inconvenient because of the existence of a complex loading system that needs space for alignment. In this study, we propose a fine alignment method using only image detection using grating images and digital moiré fringe technology. In this method, though the gratings are also selected as alignment marks for accurate measurement, they do not interfere with the physics. The grating images captured from the template and wafer are used to measure angular displacement and to form parallel digital moiré fringes. The relative linear displacement between the template and wafer is determined by detecting the spatial phase of parallel digital moiré fringes. Owing to the magnification effect of digital moiré fringes, this method is capable of generating accurate measurements. According to the experimental results, this digital moiré fringe technique is accurate to less than 10 nm. In addition, without a complex grating interference system, this method has the advantage of being easy to operate.