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Abstract
In this study, a novel digital atomic force microscope (AFM) moiré method is established to measure the displacement and strain fields. The moiré pattern is generated by the interference between the specimen grating and the virtual reference grating formed by digital image processes. The overlapped image is filtered by the 2-D wavelet transformation to obtain clear interference moiré patterns. From moiré patterns, the displacement and strain fields can be analyzed. The experimental results show that the digital AFM moiré method is very sensitive and easy to realize in nanoscale measurements.
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