Abstract
In order to enhance the emission performance of transmission-mode GaAs photocathodes used in optoelectronic field, different exponential doping structures are designed for the GaAs emission layer to generate different types of built-in electric fields. These built-in electric fields include the constant, increasing and decreasing types, which can help photoelectron transport toward the emission surface. By solving the one-dimensional continuity equation using the finite difference method, the electron concentration distribution and quantum efficiency of the three types of exponential doping GaAs photocathodes are derived. Meanwhile, the light absorption distributions in the emission layer are simulated by the finite difference time domain method. By comparing the optical absorption distribution and the electron concentration distribution, it is concluded that, among the three types of exponential doping structures, the exponential doping structure generating the increasing built-in electric field has the most sufficient long-wave light absorption capacity and the strongest photoelectron transport ability, thereby achieving the highest quantum efficiency. This theoretical work can help understand the mechanism of improving the photoemission performance of GaAs photocathodes through doping engineering.
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