Abstract
Strained InAs 0.43P 0.57/InP and strain-compensated InAs 0.43P 0.57/In 0.7Ga 0.3As 0.43P 0.57 multiple quantum well (MQW) structures were grown by gas source molecular beam epitaxy. The observations of up to 5 satellite-diffraction peaks from the high-resolution X-ray diffraction measurements demonstrate good crystalline quality for both structures. The temperature dependence of the 1e–1hh transition energies, the line width of photoluminescence (PL) spectra and emission efficiency η of the two quantum well structures are compared by low-temperature PL measurements. The temperature dependence of the 1e–1hh transitions of the two quantum well structures is similar to that of InAs 0.43P 0.57 bulk material. The thermal activation energies obtained for strain-compensated MQW are larger than those obtained for the strained one. Consequently, the PL emission efficiency decays much slower for the strain-compensated MQW than that for the strained one when temperature increases, indicating the superior temperature stability of luminescent efficiency for the strain-compensated MQW. The obtained results can be used as references to the design and fabrication of optoelectronic devices.
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