Abstract

The densities and energy levels of traps in silicon pin diodes are determined using the transient capacitance method (ICTS: isothermal capacitance transient spectroscopy) as well as the transient reverse current method (DCTS: discharge current transient spectroscopy). The traps determined by ICTS are located in the i layer (i.e., the n- region) and affect the steady-state reverse current (i.e., a generation current). Conversely, the traps determined by DCTS are probably located at the surface of the substrate.

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