Abstract
Diamond like carbon films (DLC) with high density and low internal stress are urgent demand for inertial confinement fusion (ICF) experiments. DLC films were deposited on Si-(100) substrates by coupling DC/RF magnetron sputtering with Ar as the working gas. The microstructure, mass density and internal stress of the DLC films have been studied. The films were characterized by Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), X-ray Reflectivity (XRR), surface profilometer, atomic force microscopy (AFM), field emission scanning electron microscopy (FE-SEM), scratch test and nanoindentation techniques. It is found that the DLC films deposited by coupling DC/RF magnetron sputtering have relatively high mass density (2.25–2.36g/cm3) and low internal stress (lower than 0.3GPa) compared to those prepared by conventional deposition process. The results indicate that properties of the as-deposited DLC films are strongly dependent on the ion energy which is determined by the DC voltage. It suggests that the DLC films deposited by coupling DC/RF magnetron sputtering at optimum DC voltage could be potential candidate for ICF experiments and protective coating applications.
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