Abstract
Diamond deposition on WC-Co cemented carbide was examined by chemical vapour deposition using a tantalum filament. The filament was much superior to conventional tungsten filament for high-temperature use. Diamond film was deposited at a filament temperature up to about 2600 °C for tantalum filament, which was much higher than the maximum filament temperature available for tungsten (2000 °C). The critical methane concentration in H2-CH4 gas for diamond deposition became higher with increasing filament temperature. A deposition rate about 20 times higher was obtained when using a tantalum filament compared with a tungsten filament. The origin of the improved deposition rate of diamond on WC-Co substrate using a tantalum filament is discussed.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
