Abstract
Diamond coating using hot-filament chemical vapor deposition (HFCVD) is now widely used in many fields. The quality of the diamond film and many factors determine the success of the coating, such as temperature, time, and pressure during coating. The purpose of this study was to produce coated boron-doped diamond (BDD) films by doping boron in the diamond film and to assess them through comparative analysis with foreign acid BDD, which is widely used as a water-treatment electrode in the present industry. The bending of the titanium substrate due to the high temperature during the diamond deposition was avoided by adding an intermediate layer with a columnar structure to niobium film. The filament temperature and pressure were determined through preliminary experiments, and BDD films were coated. The BDD film deposition rate was confirmed to be 100 nm/h, and the potential window increased with increasing thickness. The electrochemical activation and catalytic performance were confirmed according to the surface characteristics. Although the high deposition rate of the BDD coating is also an important factor, it was confirmed that conducting coating so that amorphous carbonization does not occur by controlling the temperature during coating can improve the electrochemical properties of BDD film.
Highlights
Many studies have been actively conducted to investigate the effects of temperature and pressure changes on diamond coating [1,2]
Which shows the morphology of the reference boron-doped diamond (BDD), (111) facets and a rectangular shape (100) are observed, and the particle size is very uneven [23,24]. This has the advantage of increasing the specific surface area of the BDD film, but this results in more diamond etching during deposition, resulting in a reduced diamond deposition rate [25,26]
The Raman spectra of the BDD films confirmed that boron was successfully doped into the diamond
Summary
Many studies have been actively conducted to investigate the effects of temperature and pressure changes on diamond coating [1,2]. The most widely used and common of these is hot-filament chemical vapor deposition (HFCVD). Diamond coatings produced by this method have several advantages. It is widely used in many studies because of its application to various substrates. The biggest advantage of HFCVD is its suitability for industrial use because it can be increased in size and can be produced at a low cost compared to other diamond-coating methods [3,4,5]
Sign-in/Register to view highlights & summary Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
