DFB LDs at DWDM wavelengths fabricated by a novel nanoimprint process for mass production and tolerance simulation

Abstract

DWDM distributed feedback laser diodes from 1540 nm to 1560 nm were manufactured on one single wafer by novel high throughput, low cost nanoimprint lithography (NIL). Thirteen ITU channels of 200 GHz spacing are obtained. The process includes two main steps: first, step flash imprint lithography (SFIL) was used to reduce the cost of a large stamp. Then soft stamps were applied to improve imprint uniformity on a large area. Errors were analyzed and tolerances to DFB-LD performance have been simulated.