Abstract
We have developed a vacuum ultraviolet absorption spectroscopy (VUVAS) technique employing a high-pressure nitrogen molecule (N2) microdischarge hollow cathode lamp (N2 MHCL) as a light source of the atomic nitrogen (N) resonance lines for measuring absolute N densities in process plasmas. The estimations of self-absorption and the emission line profiles of the N2 MHCL, which are necessary for absolute N density determination, were carried out. The measurement of absolute N densities have been demonstrated for an inductively coupled N2 plasma using the VUVAS system employing the N2 MHCL.
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