Development of thin film capacitors for power system applications by PVD technique

Abstract

Thin film capacitors are very interesting option to electrolytic capacitors, because they are simple, compact in structure and effective for fabrication of high frequency devices. Thin film coating capacitors also improved processing characteristics and better dielectric strength. This paper reports the development of thin film capacitors for DC filtering in AC/DC converter application. The design of thin film capacitor for high frequency AC/DC converter is implemented using simple simulation tools. The primary research hypothesis is that high frequency capacitance with smaller size can be implemented using Physical Vapor Deposition, PVD technique. The thickness of TiO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> , area of metal contact and dielectric properties of TiO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> are considered as parameters for thin film capacitors development.