Development of texture in TiN films deposited by filtered cathodic vacuum arc

Abstract

X-ray diffraction was used to characterize the texture in TiN films deposited by an off-plane double bend filtered cathodic vacuum arc technique. The influence of deposition pressure, substrate bias, and deposition temperature on the texture of the films was studied systematically. The texture develops from a random orientation to a mixed (1 1 1) and (2 2 0) preferred orientation with increasing deposition pressure. As substrate bias is increased, the texture evolves from a (2 0 0) preferred orientation to a mixed (1 1 1) and (2 2 0) preferred orientation at a substrate bias of −100 V. However, further increase of substrate bias changes the texture back to the (2 0 0) preferred orientation again. The deposition temperature has no significant effect on the development of the film texture. Comparing the texture with the internal stress and surface roughness, it is observed directly that the texture in the TiN films is controlled by the internal stress and surface roughness.