Abstract
Phosphorus-doped silicon dioxide PSG thin films with improved ionic conductivity were deposited via plasma-enhanced chemical vapor deposition for application as a thin-film proton exchange membrane PEM in microfabricated fuel cells. More than three orders of magnitude improvement in the ionic conductivity is obtained by P doping of low-temperature deposited SiO2. The area resistance of 3 m thick film of PSG is comparable to a 200 m thick film of Nafion. Application of these PSG films as PEM in microfuel cells yielded more than one order of magnitude improvement in power density compared to low-temperature, undoped SiO2 membranes. © 2005 The Electrochemical Society. DOI: 10.1149/1.2050587 All rights reserved.
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