Abstract
Design of the fourth generation Diffraction-Limited Storage Ring reduces aperture of vacuum chambers to a few centimeters. To satisfy the small aperture, the intense photon bombardment and the requirement of low pressure, most of the beam pipes need to be deposited with Ti-Zr-V nonevaporable getter (NEG) thin films. NEG can provide distributed pumping and low gas desorption and allow to achieve low pressure in narrow and conductance limited chambers. In this paper, Ti-Zr-V thin film was deposited by DC magnetron sputtering using Ti-Zr-V alloy target. The morphology and thickness of Ti-Zr-V are characterized by Scanning Electron Microscopy (SEM). The average grain size is evaluated using X-ray diffraction (XRD). The composition and the corresponding chemical bonding of the thin film are analyzed by X-ray Photoelectron Spectroscopy (XPS). Finally, the adhesion between the film and substrate and the vacuum performance are evaluated.
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