Analysis of a Non-Evaporable Getter of Ti-Al-Zr Thin Film with Enhanced Performance Used for Ultra-High Vacuum Generation

Abstract

Non-evaporable getter (NEG) thin films of Ti-Al-Zr and Ti-Zr were prepared on stainless-steel substrate by using the cathodic arc deposition technique. Scanning electron microscopy (SEM), energy-dispersive X-ray spectroscopy (EDX), X-ray diffraction (XRD), and in-situ X-ray photo-electron spectroscopy (XPS) were used to analyze the getter behavior of the non-evaporable getter thin films. The SEM images displayed the porous and rough surfaces of the thin films, which is an indication of high adsorption and sticking probabilities for the residual gases present in the chamber. The volume elemental composition of the thin films was measured by using EDX. The XRD patterns of the synthesized thin films indicated that the films had an amorphous nature and high structural stability. The in-situ X-ray photoelectron spectroscopy (XPS) studies revealed that the superficial layers disappeared when the non-evaporable getter of Ti-Al-Zr thin films was heated at a temperature below 250 °C for 30 minutes, there by activating the surface. However, for Ti-Zr thin films, no reasonable activation was observed at 250 °C. This outcome reveals that thin films of Ti-Al-Zr are good for reducing the outgassing and producing an ultra-high vacuum.