Abstract
Multicathode high flux metal plasma ion sources were self-developed and its performance was proved to be appropriate for the high-purity ion implantation and thin-film deposition. As key results of self-design, a bipolar pulse power supply with a peak voltage of 250 V, a repetition rate of 20 Hz, and a pulse width of 100 μs showed an output current of 2 kA and an average power of 2 kW and the operational plasma flux of multicathode ion source was well sustained even at an ion current of about 5 A. A high-voltage pulse generator was employed as a trigger power supply producing a peak voltage of 12 kV, peak current of 50 A, and stable repetition rate of 20 Hz.
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