Abstract
The next-generation display industry, it is necessary for the sputtering process to form a reactive thin film. However, the conventional power supply causes various problems such as high deposition rates and low arc energy, low efficiency in the reactive process. In this paper, we analyze the characteristics of a reactive process and proposed the existing techniques better process. Reactivity step of forming a stable plasma and improves the quality of the thin film. In addition, fast film formation speed, arc suppression, proposed a bipolar pulsed power supply unit in order to improve the deposition rate. The proposed power supply has a stable sputtering process performed by implementing a soft switching using the LLC resonant. LLC converters for high capacity 4 serial-parallel were constructed. The validity of this paper was verified through simulation and experiments.
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