Development of micro/nano structure pattern generation using direct-beam interferometry

Abstract

To generate periodic patterns with a 300 nm periodicity on PET substrate, a low-cost direct-beam interferometry device with a 405 nm GaN semiconductor laser diode (Nano Materials) is employed. A similar, cost-effective system was utilized to create periodic patterns with periods between 290 and 750 nm over a vast area using an AlInGaN 405 nm diode. While interference lithography devices are inexpensive and simple to use, they have the drawback of only being able to recreate periodic patterns that are defined by the interference patterns of the laser beams. We present a low-cost direct write lithography system that use the optical head assembly from a Blu-ray disc recorder and is capable of producing both periodic and non-periodic, high-resolution structures for use in Macro/micro/nano processes. The optical head assemblies in Blu-ray drives feature a semiconductor laser diode and a 0.85 NA objective lens for reading optical media. We can attain very huge volumes of homogeneity, throughput, process control, and reproducibility using this Direct Beam approach. We optimized simulated patterns with controlled periodicity, density, and aspect ratio by altering different input parameters and was achieved to 51 nm.