Abstract
We developed high-resistant anti-reflection (AR) coating by using Al<sub>2</sub>O<sub>3</sub>/SiO<sub>2</sub> multilayer for Yb:YAG thin disk amplifier. The AR coating was designed both for 940 nm of pump laser at an incident angle of 30 degrees and for 1030 nm of seed laser at 5 degrees. The Al<sub>2</sub>O<sub>3</sub>/SiO<sub>2</sub> multilayer was deposited by using the electron beam evaporation technique on a fused silica substrate and then the laser induced damage threshold was evaluated. The sample was irradiated by 1030 nm laser with 520 ps duration delivered from the Yb:YAG thin-disk regenerative amplifier. The measured damage threshold of the Al<sub>2</sub>O<sub>3</sub>/SiO<sub>2</sub> AR coating was 75 J/cm<sup>2</sup>.
Published Version
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