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Abstract
A passively polarized holographic lithography system is proposed for fabricating highly uniform 2D crossed-array structures with periodic tunability and high throughput. The dielectric-film-based polarization modulation scheme is applied to an orthogonal two-axis Lloyd's mirror interferometer to guide the polarization modulation at the interfaces of the mirrors and simplify the exposure-system configuration for large-area fabrication. The proposed polarization-modulation system can fabricate stable large-area (30 mm × 30 mm) array structures with a wide period range from 742 to 1500 nm. Moreover, the established polarization-modulation model could be expanded with multiple dielectric films for attaining higher periodic tunability.
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