Abstract
Abstract We developed an all-solution-processed nanocrystal memory containing high density (∼1 × 10 12 particles·cm −2 ) Au-SiO 2 core-shell nanoparticles (NPs) within a uniform HfO 2 matrix. High-quality HfO 2 high-κ oxide composed of ultra-thin ( 2 core-shell nanocomposite was also constructed by solution process using 3-aminopropyltrimethoxysilane (APTMS) as a functional mediator. This APTMS provides dual functions: (1) to serve as a binder for catching colloidal Au NPs onto the HfO 2 substrate, and (2) to form a protective layer to cover up the Au NP core. The APTMS shell layer was well controlled through the self-assembly monolayer (SAM) layer-by-layer process with a self-limiting feature. It thermally decomposed into sub-nano thick SiO 2 shell by post-deposition annealing, playing a key role in surmounting the deficiency of HfO 2 for the use of both the tunnel oxide and the control oxide in the nanocrystal memory. This approach efficiently improved the application of a crystalline HfO 2 nano-film for electronic device. By elaborately integrating the solution processes of the HfO 2 oxide layer and the Au-SiO 2 core-shell NPs, a high-performance nanocrystal memory was obtained. This study demonstrated the potential of chemical solution process for nanofabrication application.
Published Version
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