Development of a parameterization image stitching algorithm for ultrashort throw laser MEMS projectors

Abstract

AbstractWe present a novel design of a parameterization image stitching algorithm for ultrashort throw laser MEMS projectors. The resultant method allows the use of projectors with short or even long throw ratios to achieve ultrashort throw projection through a parameterized algorithm to stitch multiple images into one single frame, alleviating the trade‐off between the resolution and frame rate in conventional laser MEMS displays. To evaluate the effectiveness, we construct a test system that consists of three off‐the‐shelf projectors with a throw ratio of 1.3 and three planar reflective mirrors. Using our method, the integrated system yields an ultrashort throw ratio of 0.26, greatly reducing the projection distance from 12 to 2.6 ft for the 120‐in. screen in diagonal. Moreover, our algorithm can be fine‐tuned to correct for image distortion, intensity variation, and edge mismatch induced by two‐axis light beam steering, thereby further improving the image quality.