Abstract
We developed a new pulse DC plasma CVD layer deposition process for a-Si photoreceptor drums instead of the ordinary high frequency 13.56 MHz plasma process. This has made the layer deposition process speed 2 times faster, minimized by-product powder generation and improved the surface smoothness of the a-Si drum. Through these improvements, we realized production cost reduction. This makes it easier to offer small diameter a-Si drums for tandem color printers, where growth in demand is predicted.
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