Abstract
.Pulsed Laser Deposition (PLD) is a powerful technique to grow thin films. Oxides, Magnetics and superconducting materials have been obtained by PLD and theirs properties are strongly dependent of deposition parameters. The construction of a simple and cheap PLD system that is suitable for growing various thin films, including magnetic materials, controlling some deposition parameters is presented. The design characteristics and construction are presented for each one of the devices that compose this PLD system. The equipment has the possibility of carrying out films deposition using up to five targets under controlled atmosphere and substrate temperature. The system also allows controlling the cool off sample time after growing up films at high temperatures. A wide range of relative speeds between target and substrate axial rotation can be externally controlled. With the configuration and the dimensions adopted in their construction, a PLD system of great experimental flexibility is achieved, at a very low cost regarding the commercial systems. To evaluate their performance and effectiveness, the deposition characteristics of a BaFe12O19 film on (0001) sapphire substrate is presented.
Highlights
Thin films are prepared using diverse methods such as sputtering [1], sputtering by radio frequency [2], sol-gel deposition [3], liquid-phase epitaxy [4], Metal Organic Chemical Vapor Deposition (MOCVD) [5], Molecular Beam Epitaxy (MBE) [6] and Pulsed Laser Deposition (PLD) [7] among others.PLD, is one of the most versatile and powerful techniques to produce thin films
The construction of a simple and cheap PLD system that is suitable for growing various thin films, including magnetic materials, controlling some deposition parameters is presented
A system of deposition having the properties referred to above, can be purchased at a high cost, in this article we show the development and construction of a cheap, versatile thin films growing system by PLD
Summary
PLD, is one of the most versatile and powerful techniques to produce thin films Their main characteristics are: 1) high stoichiometric reproduction of complex materials into thin films, 2) the evaporated species obtain an important kinetic energy (100 eV to 500 eV), which improve its redistribution on the substrate surface, contributing to superficial mobility, obtaining less rough films, besides allowing make depositions at smaller temperatures than conventional ones [8], 3) the target material does not require important pre-processing, 4) it allows the films growth of materials with high fusion temperature, 5) films are obtained with high reproducibility, and high deposition rates [7,8,9,10,11,12,13]. This plume is a hot plasma (6000 ̊C K approximately), that soon is deposited in a substrate, where the film grows up pulse by pulse
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