Abstract

This work presents a process design kit (PDK) for a 0.15 μm GaAs pHEMT process for low-noise MMIC applications developed for AWR Microwave Office (MWO). A complete set of basic elements is proposed, such as TaN thin film resistors and mesa-resistors, capacitors, inductors, and transistors. The developed PDK can be used in technology transfer or education.

Highlights

  • At present, monolithic microwave integrated circuits (MMICs) are designed and produced using electronic design automation (EDA) tools (Figure 1) [1–3]

  • As the researchers and engineers of MEPhI developed a 0.15 μm GaAs pHEMT process for low-noise MMICs, we decided to make a process design kit (PDK) for this process first

  • We developed topology templates of basic MMIC elements

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Summary

Introduction

Monolithic microwave integrated circuits (MMICs) are designed and produced using electronic design automation (EDA) tools (Figure 1) [1–3]. Large factories offering MMIC production services (called foundries) must provide their customers with a process design kit, so that the customers can design MMICs for their own applications. Publisher’s Note: MDPI stays neutral with regard to jurisdictional claims in published maps and institutional affiliations. The Institute of Nanoengineering in Electronics, Spintronics and Photonics of MEPhI University has developed a semiconductor process for the production of different types of circuits and semiconductor devices, including RF transistors and MMICs. There is a need to develop a PDK for the available processes for its own and collaborating design centers (by analogy with foundries). As the researchers and engineers of MEPhI developed a 0.15 μm GaAs pHEMT process for low-noise MMICs, we decided to make a PDK for this process first.

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