Abstract
This work presents a process design kit (PDK) for a 0.15 μm GaAs pHEMT process for low-noise MMIC applications developed for AWR Microwave Office (MWO). A complete set of basic elements is proposed, such as TaN thin film resistors and mesa-resistors, capacitors, inductors, and transistors. The developed PDK can be used in technology transfer or education.
Highlights
At present, monolithic microwave integrated circuits (MMICs) are designed and produced using electronic design automation (EDA) tools (Figure 1) [1–3]
As the researchers and engineers of MEPhI developed a 0.15 μm GaAs pHEMT process for low-noise MMICs, we decided to make a process design kit (PDK) for this process first
We developed topology templates of basic MMIC elements
Summary
Monolithic microwave integrated circuits (MMICs) are designed and produced using electronic design automation (EDA) tools (Figure 1) [1–3]. Large factories offering MMIC production services (called foundries) must provide their customers with a process design kit, so that the customers can design MMICs for their own applications. Publisher’s Note: MDPI stays neutral with regard to jurisdictional claims in published maps and institutional affiliations. The Institute of Nanoengineering in Electronics, Spintronics and Photonics of MEPhI University has developed a semiconductor process for the production of different types of circuits and semiconductor devices, including RF transistors and MMICs. There is a need to develop a PDK for the available processes for its own and collaborating design centers (by analogy with foundries). As the researchers and engineers of MEPhI developed a 0.15 μm GaAs pHEMT process for low-noise MMICs, we decided to make a PDK for this process first.
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