Development of 13 GHz compact electron cyclotron resonance ion source

Abstract

An extremely compact, all-permanent-magnet electron cyclotron resonance ion source was designed and manufactured mainly for materials development. The ion source was installed in a 400 kV ion implanter, and a heavy ion beam in the mega-electron-volt (MeV) energy region with high beam intensity was available using multiply charged ions from the ion source. The magnet measured 120 mm in length and 30 mm and 110 mm in inner and outer diameters, respectively. A high magnetic field in the plasma chamber was formed by the unique permanent magnet structure. The maximum and minimum mirror fields achieved were 0.62 and 0.40 T, respectively. Up to 10 W of 13 GHz microwave power was fed to the source by the solid-state microwave generator, and the minimum B structure was formed in the plasma chamber. In the preliminary result at the test stand, an O5+ beam of 11 eμA, an Ar4+ beam of 80 eμA, and a He2+ beam of 100 eμA were available and an Ar12+ beam of 10 eμA was obtained with microwave power of only 10 W. The beam performance of the new source and the previous 10 GHz source developed at TIARA were compared.