Development and Implementation of a Rotating Nanoimprint Lithography Tool for Orthogonal Imprinting on Edges of Curved Surfaces

Abstract

Uniform molding and demolding of structures on highly curved surfaces through conformal contact is a crucial yet often-overlooked aspect of nanoimprint lithography (NIL). This study describes the development of a NIL tool and its integration into a nanopositioning and nanomeasuring machine to achieve high-precision orthogonal molding and demolding for soft ultraviolet-assisted NIL (soft UV-NIL). The process was implemented primarily on the edges of highly curved plano-convex substrates to demonstrate structure uniformity on the edges. High-resolution nanostructures of sub-200-nm lateral dimension and microstructures in the range of tens of microns were imprinted. However, the nanostructures on the edges of the large, curved substrates were difficult to characterize precisely. Therefore, microstructures were used to measure the structure fidelity and were characterized using profilometry, white light interferometry, and confocal laser scanning microscopy. Regardless of the restricted imaging capabilities at high inclinations for high-resolution nanostructures, the scanning electron microscope (SEM) imaging of the structures on top of the lens substrate and at an inclination of 45° was performed. The micro and nanostructures were successfully imprinted on the edges of the plano-convex lens at angles of 45°, 60°,and 90° from the center of rotation of the rotating NIL tool. The method enables precise imprinting at high inclinations, thereby presenting a different approach to soft UV-NIL on curved surfaces.