Abstract
The experimental technique is described and the results of a study of the resistance to high vacuum electrical breakdowns of copper samples coated with thin films of titanium nitride are presented. The studies were carried out in a two-electrode system having the so-called “plane-tip” configuration. Using the method of X-ray diffractometry, we studied the effect of the structure of titanium nitride films on their efficiency as a material that reduces the probability of breakdown.
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