Abstract
Evaporated Fe films were studied using transmission electron microscopy to determine why they trap large amounts (∼1 at.%) of deuterium, which is several orders of magnitude more than expected based on bulk solubility. As-deposited films were found to contain high concentrations (∼3×10 17/cm 3) of microvoids which formed as a result of geometrical shadowing and limited surface diffusion during deposition. The reduction in the films' ability to absorb deuterium after annealing, and the deuterium capacity of the films indicated that the deuterium was trapped at voids. These results suggest that deuterium charging combined with FRES analysis is a useful method for measuring the void concentrations in thin metal films.
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