Abstract
Knowledge of the solubility rate dependence on exposure dose S(D) gives possibility to estimate the values of the radiation efficiency, sensitivity and contrast characteristics in electron and ion lithography. The idea for interconnection between the sensitivity and the contrast characteristics for an arbitrary combination of resist and developer (i.e. at a given molecular weight, resist density and radiation efficiency of the charged particles) is a base for the sensitivity optimisation in order to achieve the required contrast at chosen development conditions. The contrast parameter value ys (related to the traditionally used contrast parameter y d ) is determined by the slope of the dependence S(D) of the resist solubility rate Son the average exposure dose D. KeywordsExposure DoseRadiation EfficiencyContrast CharacteristicElectron ExposureArbitrary CombinationThese keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.
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