Determination of spatially resolved trapping parameters in silicon with injection dependent carrier density imaging

Abstract

We present spatially resolved and injection dependent excess carrier lifetime measurements on silicon. At low level injection conditions an anomalous increase often interferes in such measurements. The origin of the anomalous increase is discussed. Assuming trapping as the origin, highly resolved images of trap parameters together with low level injection recombination lifetimes with strongly reduced trapping effects have been obtained. A theoretical model for infrared lifetime imaging based on the Hornbeck and Haynes model [J. A. Hornbeck and J. R. Haynes, Phys. Rev. 97, 311 (1955)] is presented which describes the trapping effect on the measured lifetime. This model is fitted to experimental spatially resolved data to extract trapping parameters, particularly trap density and the trap-escape ratio, i.e., the ratio between escape rate of minority carriers from the trap level into the minority band (detrapping) and trap rate from the minority band into the trap level (trapping). An upper bound for the low level injection recombination lifetimes is determined. Lifetime and trapping parameters are compared with dislocation density maps. A strong correlation is found between the total trap density and the crystal defect density.