Abstract
A method for the determination of trace of 14 rare earth elements (REEs) as impurities in high purity samarium oxide (Sm 2O 3) using inductively coupled plasma mass spectrometry (ICP-MS) was described. Analytes, such as La, Ce, Pr, Nd, Eu, Gd, Tb, Lu and Y were measured without Sm matrix separation because of no interference problems occurring that could affect the analysis of these elements. On the other hand, analytes, such as Dy, Ho, Er, Tm and Yb were carried out after Sm matrix being eliminated completely by means of 2-ethylhexyl hydrogen-ethylhexy phosphonate (EHEHP) extraction chromatographic separation. The inherent problem associated with matrix-induced suppression was effectively compensated with spiking In as internal standard element and the mass spectra isobaric interferences of atomic and molecular ions arose from Sm matrix had been overcome after the removal of Sm matrix. The limits of quantitations (LOQ) for 14 REEs impurities were from 0.01 to 0.07 μg g −1 together with the recoveries of spiking sample of 14 REEs were found to be in the range of 85–110% and the proposed method precision was less than 5%. A synthetic standard Sm 2O 3 sample with well-known 14 REEs concentrations was prepared and analysed in order to prove the accuracy and precision of the proposed method together with another high purity Sm 2O 3 was also measured using ICP-MS. The methodology had been found to be suitable for the determination of trace of 14 REEs in 99.999–99.9999% high purity Sm 2O 3.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.