Abstract
A modified version of the binary collision computer code Marlowe that can deal with low energy implant simulations is presented. In this version the trajectories of the particles are calculated by numerically solving their equations of motion instead of simply using the asymptotes, which is the usual approach. The model has been applied to the simulation of 0·5 keV boron implants into amorphous and crystalline silicon. The agreement with the experimental secondary ion mass spectrometry profiles is better than that obtained using the asymptotic approximation.MST/3302
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
