Designs of planar pattern manipulation surfaces using patch resonating elements loading with dual‐polarized slots for multi‐user systems

Abstract

In this article, we propose the designs of planar pattern manipulation surfaces (PPMSs) applying patch resonating elements loading with dual-polarized slots for multi-user communication systems in future networks. Firstly, the amplitude and phase of the element reflection coefficient are discussed with resorting to the varied length of the slot. Secondly, the dual-polarized slot-loaded patch is consequently utilized for obtaining the proposed PPMS. By suitably selecting the reflection coefficient distribution of the entire PPMS, the reflected wave can be manipulated to gain different dual-beam reflection properties with the response of dual-polarization. In the final, two prototypes with 10 × 10 elements are fabricated and tested to prove the presented design concept. Measurements agree well with calculated results, indicating that dual-beam reflections with the controllable beam pointing ability are well achieved so as to provide effective coverage for multiple users simultaneously.