Design of a Closed Loop Computer Controlled System for Selective Area Laser Deposition. I. Laser Systems, Gasflow, and Substrate Temperature Control

Abstract

Abstract A closed loop computer controlled system to implement selective area laser deposition (SALD) is described. The SALD process uses a laser beam that is moved relative to a substrate to control the region over which chemical vapor deposition occurs. Deposit shape control is achieved by controlling the laser beam path and power. The system combines a remote microwave plasma source with scanning laser induced chemical vapor deposition. Major design goals included computer control of process variables including reactor pressure, source gas flow rates, laser power and beam position, applied microwave power and tuning, and substrate bias temperature. Scanned shape data files are derived from industry standard “.STL” tessellated surface meshes. Control strategies for these process variables are described.