Abstract
Three dimensional metasurface structures hold the potential for better performing devices and interesting new properties. However, at optical frequencies it is very difficult to fabricate truly three dimensional designs. One of the most promising techniques is Membrane Projection Lithography (MPL), which can allow for dielectric and metallic inclusions to be deposited on the side wall of a cavity. However, the design process is difficult due to the large search space afforded by these 3D structures and the many coupling environments that arise between neighboring unit cells. Fortunately, advanced optimization techniques have been developed that allow for the space to be fully explored in an efficient manner for optimal designs.
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