Design and process variation analysis of CNTFET-based ternary memory cells

Abstract

Two novel ternary CNTFET-based SRAM cells are proposed in this paper. The first proposed CNTFET SRAM uses additional CNTFETs to sink the bit lines to ground; its operation is nearly independent of the ternary values. The second cell utilizes the traditional voltage controller (or supply) of a binary SRAM in a ternary SRAM; it consists of adding two CNTFETs to the first proposed cell. CNTFET features (such as sizing and density) and performance metrics (such as SNM and PDP) and write/read times are considered and assessed in detail. The impact of different features (such as chirality and CNT density) is also analyzed with respect to the operations of the memory cells. The effects of different process variations (such as lithography and density/number of CNTs) are extensively evaluated with respect to performance metrics. In nearly all cases, the proposed cells outperform existing CNTFET-based cells by showing a small standard deviation in the simulated memory circuits.