Design and modeling of chemical vapor deposition reactors

Abstract

The performance of chemical vapor deposition (CVD) reactors is strongly dependent on fluid flow, heat transport and mass transport. The optimized design of CVD reactors requires an understanding of how these phenomena influence the uniformity in growth rate, composition, and doping. This article will review recent developments in the study of CVD reactors. The focus will be on understanding how the interplay of physical properties and reactor geometries influences fluid flow and growth uniformity. Both numerical models and flow visualization studies of transport phenomena are reviewed. Despite the considerable power of these computational and experimental tools, the greatest asset in reactor design is the ability to conceptualize the interplay and relative significance of different transport phenomena. With this in mind, the underlying goal of this review is to provide a conceptual framework of the fundamental transport phenomena at work in CVD reactors, the conditions under which each of these phenomena plays a roll, and their combined impact on reactor design.