Design and implementation of the logic gates using electrically doped configurable polarity control double gate tunnel FET

Abstract

This paper designs and implements the basic logic and universal gates based on the proposed electrically doped, configurable polarity control double gate tunnel FET (ED-CPC-DGTFET). In contrast to the CMOS and MOSFET, the primary concern of the proposed device is to overcome the transistor count needed to design logic gates. A few compact realizations of logic gates have been reported earlier using conventional double-gate TFETs. The main key to designing and implementing logic gates with the proposed structure is controlling the channel’s tunneling barrier height by altering the gate electrode work function. Additionally, abrupt interband tunneling of TFET by varying gate bias makes the device appropriate for implementing logic gates. The proposed device has a dynamic configuration that can change from n-type to p-type DGTFET by varying the bias at PG-1 and PG-2. Since lightly doped TFETs have a low ON-state current therefore, a high-k material (HfO 2 ) is employed in place of SiO 2 on top of the source side to enhance the ON-state current. Using two-dimensional simulations, the device is designed to implement logic gates with gate lengths of 50 nm and silicon body thicknesses of 10 nm (t si ). OR and AND logic gates are implemented using the n-type ED-CPC-DGTFET structure, and universal gates are implemented using the p-type variant of the proposed ED-CPC-DGTFET structure by independently biasing the top and bottom gates against various inputs.