Abstract
An unshielded, dual-element horizontal MR head utilizing a differential detection technique was designed and fabricated. A new process was developed for etching MR sensor gaps utilizing a combination of direct-write e-beam lithography, reactive ion etching, and ion milling, which allowed heads to be fabricated with MR gap lengths as small as 0.15 /spl mu/m. Fabricated heads were tested by quasi-statically passing them over prerecorded transitions on flexible particulate media. Calculations from two-dimensional analytical and finite-element models correlate well with readback data.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">></ETX>
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