Abstract
The authors have applied cross-sectional x-ray microdiffraction to measure depth-resolved in-plane residual strain in nanocrystalline MoN∕Mo bilayer films deposited on Si. Compressive strains with large gradients were found in the as-deposited films. After thermal annealing, the strain profiles and diffraction peak widths of the MoN and Mo layers were altered. These findings provide insights on the relationship between defects introduced during film processing and the effect of annealing on the structure and properties of magnetron-sputtered nanocrystalline films.
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