Depth Profiling of Thin Films with Pulsed Glow Discharge Atomic Emission Spectrometry

Abstract

The application of microsecond pulsed Grimm glow discharge atomic emission spectrometry for depth profiling of thin films is examined. The effects of pulsed conditions including pulse voltage, pulse frequency, pulse width, and Ar pressure on depth profiling performance were characterized for Zn and Cu coatings on steel. Using optimized conditions, linear calibration curves of coating thickness for Zn (6.1-26.9 μm) and Cu (50-500 nm) on steel were achieved. A precision of 2-5% relative standard deviation was determined. An ultrathin coating of Cu (10 nm) on steel was also measured by this technique.