Abstract
Depth profiles of the optical constants, carrier mobility, and carrier density of spin-coated poly(3,4-ethylenedioxythiophene):poly(styrene sulfonic acid) (PEDOT:PSS) films were investigated by real-time characterization by spectroscopic ellipsometry (SE) during argon plasma etching at atmospheric pressure. Spectral analysis revealed that homogeneous etching occurred within 10–15 nm of the top surface, followed by the appearance of a conductive PEDOT phase and surface roughening, which originated from the depth profile of the PEDOT-to-PSS molar concentration ratio. The use of the plasma-etched PEDOT:PSS layer relatively improved the performance of the cupper phthalocyanine (CuPc)/C60 organic thin-films solar cells as a hole-transport layer with higher optical transmittance by adjusting the plasma etching condition.
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