Abstract
A novel technique, channel-spark pulsed electron (YBCO) beam ablation, was applied to deposit high quality c-axis oriented YBa 2Cu 3O 7− x thin films with T c0 around 88 K. The apparatus, which is extremely compact, simple and inexpensive, is described. The electron beam power density and the efficiency of channel-spark ablation were studied. The effects of the beam and some processing parameters on T c of YBCO films fabricated on SrTiO 3 (100) substrates are reported.
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