Deposition of WO 3 thin films by the sol—gel method

Abstract

WO 3 films were multicoated on the microscope slide glass and ITO-coated glass using a tungsten alkoxide type solution by the sol—gel deposition process. The effect of dipping and processing parameters on the structure, optical and electrochemical properties of the film were also investigated. Coating using alkoxide solution was very uniformed for low dipping speed of 0.005 m s −1, but thickness variations across the sample became apparent for dipping speeds greater than 0.007 m s −1. Electrochemical coloration experiments showed that films fired at lower temperatures color more easily than film fired to > 200 °C. Rutherford backscattering spectroscopy studies revealed that K + ions were uniformly distributed throughout the WO 3 layer in the colored sample.